Post Cure Chemical Resistance

Category Chemical Dipping Result
Solvent Acetone 23 ℃-3 h No change
IPA 23 ℃-3 h No change
NMP 23 ℃-3 h No change
Alkaline solution 5% NaOH 23 ℃-4 h No change
TMAH 2.38% 23 ℃-3 h No change
Acid solution 5% H2SO4 23 ℃-3 h No change
5% HCl 23 ℃-3 h No change

 

Contact Us about TMMFTM S2000 & TMMRTM S2000 series

Contact Us

New Business Development Division  Phone : +81-467-75-9916
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MEMS Engineer Forum 2017        出展のお知らせ

● 会期 : 2017年4月26日(水) ~ 27日(木)
● 会場 : 両国 KFCホール
● 展示会URL : https://www.m-e-f.info/